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Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors (CROSBI ID 242457)

Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija

Gebavi, Hrvoje ; Mikac, Lara ; Marciuš, Marijan ; Šikić, Mile ; Mohaček-Grošev, Vlasta ; Janči, Tibor ; Vidaček, Sanja ; Hasanspahić, Emina ; Omanović Miklićanin, Enisa ; Ivanda, Mile Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors // Croatica chemica acta, 90 (2017), 2; 259-262. doi: 10.5562/cca3127

Podaci o odgovornosti

Gebavi, Hrvoje ; Mikac, Lara ; Marciuš, Marijan ; Šikić, Mile ; Mohaček-Grošev, Vlasta ; Janči, Tibor ; Vidaček, Sanja ; Hasanspahić, Emina ; Omanović Miklićanin, Enisa ; Ivanda, Mile

engleski

Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors

The silicon based substrates for surface enhanced Raman spectroscopy (SERS) have been synthesized and tested. The silver-assisted electroless wet chemical etching method has been utilized for silicon nanowires production which has been proved as the promising SERS substrate. The morphology of the silicon nanowires coated with silver nanoparticles has been examined by scanning electron microscopy. The SERS measurements tested on rhodamine 6G molecules indicated the optimal silicon nanowire substrate production obtained for 5 M hydrofluoric acid and 30 mM silver nitrate etching solution. The results show SERS detection limit of 10–8 M rhodamine in aqueous solution.

electroless chemical etching ; surface enhanced Raman spectroscopy ; silicon nanowires ; rhodamine

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Podaci o izdanju

90 (2)

2017.

259-262

objavljeno

0011-1643

1334-417X

10.5562/cca3127

Povezanost rada

Fizika, Kemija

Poveznice
Indeksiranost