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Electrodeposition of Thin Sulfide Films: Nucleation and Growth Observed for Bi_2S_3 (CROSBI ID 93506)

Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija

Grubač, Zoran ; Metikoš-Huković, Mirjana Electrodeposition of Thin Sulfide Films: Nucleation and Growth Observed for Bi_2S_3 // Thin solid films, 413 (2002), 1-2; 248-256-x

Podaci o odgovornosti

Grubač, Zoran ; Metikoš-Huković, Mirjana

engleski

Electrodeposition of Thin Sulfide Films: Nucleation and Growth Observed for Bi_2S_3

The potentiostatic pulse technique proved to be the most powerful electrochemical technique for in situ studies of the early stages of Bi_2S_3 electrodeposition on bismuth.The current-time response recorded at the overpotentials in the vicinity of Er (Bi_2S_3/Bi) in dependence of hydrosulfide ion concentrations, was described by a theoretical expression for 3D progressive nucleation and growth under diffusion control. Through the application of relations which hold true for such a nucleation model, the following parameters were determined: (i) the anodic nucleation potential (E_A_N), (ii) the rate of nucleation (A_N_0), (iii) the diffusion coefficient (D) and (iv) the density of the growing sites (N_s).

nucleation; bismuth; sulfide films; chronoamperometry; cyclic voltammetry

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Podaci o izdanju

413 (1-2)

2002.

248-256-x

objavljeno

0040-6090

Povezanost rada

Kemija, Kemijsko inženjerstvo

Indeksiranost