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izvor podataka: crosbi

Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films (CROSBI ID 108757)

Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija

Masetti, Enrico ; Bulir, Jiri ; Gagliardi, Serena ; Janicki, Vesna ; Krasilnikova, Anna ; Di Santo, G. ; Coluzza, C. Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films // Thin solid films, 455-456 (2004), 468-472-x

Podaci o odgovornosti

Masetti, Enrico ; Bulir, Jiri ; Gagliardi, Serena ; Janicki, Vesna ; Krasilnikova, Anna ; Di Santo, G. ; Coluzza, C.

engleski

Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films

The chemical reactions and diffusion processes at the interface of a metal with oxides and nitrides are a critical issue in the production of metal-dielectric optical filters. The optical properties of these filters depend on the quality of the interfaces between the metal layer and the adjacent dielectric layers. The chemical and physical processes occurring at the silver-dielectric interface are studied by means of ellipsometry and XPS analysis and comprise the subject of the present work.

Ellipsometry; XPS; Silver; Interfaces

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Podaci o izdanju

455-456

2004.

468-472-x

objavljeno

0040-6090

Povezanost rada

Fizika

Indeksiranost