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Synthesis of nanocrystalline TiO2 on different substrates

A chemical vapour deposition (CVD) synthetic method to nanocrystalline titanium has been carefully investigated on different substrates. CVD was performed at low temperatures of 320 0C onto KCl crystal, KBr pellet, Al foil and freshly sliced mica. Films of approximately 1 mm thickness were obtained from 1M solution of TiCl4 in dichloromethane (Aldrich). Influence of the substrate to the crystallographic orientation of the films, regarding the substrate, was investigated by transmission microscopy. TEM investigations were carried out by using Morgagni FP 5005 microscope. Bright-field (BF) image of TiO2 sample prepared on KCl substrate shown on Fig.1 reveals large number of grains which are differently oriented regarding incoming electron beam. Fig. 2 is showing TiO2 sample prepared on Al foil.

chemical vapour deposition (CVD); TEM; titanium dioxide

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