engleski

Al-W amorphous thin films

Completely amorphous Al-W thin films were prepared by magnetron codeposition in the Al82W18 - Al63W37 composition range. Thermal stability of the amorphous films was investigated by the continuous in situ electric resistance measurements up to 720°C, and a prolonged annealing in vacuum at high subcrystallization temperatures. The change in film structure caused by isochronal and isothermal heat treatments was determined by the XRD method. The crystallization temperatures were determined within a whole compositional range of amorphicity. A pronounced structural relaxation of the Al-W amorphous films was attributed to specific electronic structure of aluminum. Mechanical properties of the Al-W thin films improved, while corrosive properties only slightly degraded upon crystallization of the amorphous Al-W thin films in very aggressive environments and in the presence of aggressive Cl- anions.

amorphous alloys; aluminum; tungsten; magnetron sputtering; thermal stability; microhardness; corrosion

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