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Infrared study of Si-rich silicon oxide films deposited by plasma-enhanced chemical vapor deposition (CROSBI ID 77405)
Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija
Sassella, Adele ; Borghesi Alessandro ; Corni, F. ; Monelli, A. ; Ottaviani, G. ; Tonini, R ; Pivac, Branko ; Baccetta, M. ; Zanotti, L.
Infrared study of Si-rich silicon oxide films deposited by plasma-enhanced chemical vapor deposition // Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15 (1997), 377-389-x
Podaci o odgovornosti
Sassella, Adele ; Borghesi Alessandro ; Corni, F. ; Monelli, A. ; Ottaviani, G. ; Tonini, R ; Pivac, Branko ; Baccetta, M. ; Zanotti, L.
engleski
Infrared study of Si-rich silicon oxide films deposited by plasma-enhanced chemical vapor deposition
Infrared study of Si-rich silicon oxide films deposited by plasma-enhanced chemical vapor deposition
thin films; silicon oxide; infrared; defcts; PECVD
nije evidentirano
nije evidentirano
nije evidentirano
nije evidentirano
nije evidentirano
nije evidentirano
Podaci o izdanju
15
1997.
377-389-x
objavljeno
0734-2101
Povezanost rada
Povezane osobe
Povezane ustanove
