engleski

The influence of post deposition plasma treatment on SnOx structural properties

Thin SnOx films deposited by APCVD have been exposed to hydrogen plasma. Influence of hydrogen plasma on SnOx film properties was investigated by GISAXS, XRD, SEM, XPS and transmittance measurement in visible wavelength range. As deposited films were nano-crystalline, the average crystallite size was between 15 and 40 nm and preferred orientation was in [200] direction. By exposure to hydrogen plasma, the degree of preferential orientation was decreased, the average crystal size was lowered and the micro-strain increased. The hydrogen plasma etched away part of surface layer, possibly preferentially trough process of SnOx reduction. GISAXS results suggest that as deposited samples were built of nano-crystals in shape of non truncated pyramids. After plasma treatment, their shape was greatly distorted and the GISAXS signal becomes isotropic.

tin-oxide; TCO; GISAXS; XRD; SEM; XPS

Proceedings of the 11th Joint Vacuum Conference (JVC-11) Prague, Czech Republic 24-28 September 2006 ; edited by V. Matolín and K. Mašek