engleski

SPUTTER-DEPOSITED AMORPHOUS-LIKE TUNGSTEN

The sputter-deposited films tend to have high residual stress, which changes from strongly compressive to tensile with increasing working gas pressure. Simultaneously, phase composition of tungsten films changes from predominantly  -W form to  -W modification. The formation and stabilization of  -W in case of sputter-deposited tungsten films is attributed to the incorporation of oxygen in the film.

tungsten; sputtering; amorphous

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