Structural and Optical Properties of Silicon Nanocrystals Prepared by Phase Separation of Si-rich Silicon Oxide (CROSBI ID 529666)
Prilog sa skupa u zborniku | izvorni znanstveni rad | međunarodna recenzija
Podaci o odgovornosti
Ristić, Davor ; Ivanda, Mile ; Biljanović, Petar ; Žonja, Sanja ; Furić, Krešimir ; Musić, Svetozar ; Ristić, Mira ; Montagna, Maurizio ; Ferrari, Maurizio ; Righini, C.G.
engleski
Structural and Optical Properties of Silicon Nanocrystals Prepared by Phase Separation of Si-rich Silicon Oxide
The Si-rich silicon oxide (SiO_x) thin films are prepared on silica substrates by low pressure chemical vapor deposition (LPCVD) method and by physical vapor deposition method (PVD). The oxygen concentration x is controlled by the ratio of the partial pressures of N_2O and SiH_4 gases in the reaction chamber. In order to induce the phase separation on SiO_2 and Si nanostructures the samples are annealed at the temperatures of 900-1000°C. The structural and optical properties of the samples are investigated by Raman spectroscopy.
Si-rich silicon oxide; LPCVD; PVD; Raman spectroscopy
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Podaci o prilogu
40-44-x.
2007.
objavljeno
Podaci o matičnoj publikaciji
Proceedings of the 30th MIPRO 2007 International Convention
Biljanović, P. ; Skala, K.
Rijeka: Hrvatska udruga za informacijsku i komunikacijsku tehnologiju, elektroniku i mikroelektroniku - MIPRO
Podaci o skupu
30th Jubilee of the International Convention MIPRO
predavanje
21.05.2007-25.05.2007
Opatija, Hrvatska