engleski

Structural properties of transparent conductive oxides by x-ray spectroscopy

Transparent conductive oxides are interesting materials, in particularly as front contacts in thin film solar cells. Theirs structural properties as crystallinity, individual crystal sizes, surface roughness and strain determinates optical and electrical properties. In order to explore the correlation between optical and electrical properties with structure, as well as influence of deposition condition on growth and structure, it is important to know the structural data as accurate as possible. The samples, thin SnOx and ZnOx films on glass, were deposited by chemical vapour deposition and electro-chemical deposition under various deposition conditions. When using x-ray diffraction (XRD) as tool for structural analysis, the conventional set-up for measurements was used. In analysis of crystal size, two main approaches were used. In first approach, the size of crystals was estimated used Scherer formula while. In second type of analysis the fact that line broadening is consequence of several contributions will be used in estimation the crystal size, individual size distribution and strain by Rietveld refinement and "Breath" method. The results all of applied methods were compared and accuracy as well as suitability each of methods in thin film analysis was discussed. Structural properties were correlated with electrical and optical properties and in some extend with characteristics of deposition methods.

transparent conductive oxides; x-ray spectroscopy

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