engleski

Chemical composition of alloys prepared by magnetron sputtering

Thin film alloys are frequently prepared by codeposition from two or more magnetrons simultaneously operated in a deposition chamber. Difference between the IU characteristics of singularly operated magnetrons, and those of magnetrons operated simulatenously during codeposition, reveals the perturbation introduced by respective magnetron plasmas interaction. A main consequence of these perturbations is the change of deposition rates of codeposited materials, which leads to the departure of the true composition of prepared material from the prescribed composition of the film. The magnetrons interaction mostly affects discharge operating voltage, and thus the average energy of sputtering (argon) ions, which allows to estimate the change of respective deposition rates of codepositing magnetrons. Two series of binary alloys (Al-Mo, Ag-W) were prepared in a wide range of composition by magnetron codeposition from two sources. A chemical composition of the samples has been determined by the Rutherford Backscattering method, and compared to the nominal composition as prescribed from the deposition rates measured by singularly operated magnetrons. The observed difference in composition will be correlated with the change of operating conditions of two magnetrons due to their respective plasmas interaction.

magnetron sputtering; alloys; chemical composition

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