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Correlation between hardness and stress in Al-(Nb, Mo, Ta) thin films

Thin films of AlxNb1− x (95 ≥ x ≥ 20), AlxMo1− x (90 ≥ x ≥ 20) and AlxTa1− x (95 ≥ x ≥ 20) have been prepared by magnetron codeposition in the CMS 18 sputtering system at room temperature. The structure of the as-deposited films was examined by the X– ray diffraction. The films thickness and stress were measured by the Rank Taylor Hobson Form Talysurf. Average film thickness was from 325 to 400 nm, depending on the film composition. The microhardness (load 2mN) was examined by the micro- and nano-hardness device Fischerscope H100C. For all alloy compositions the microhardness is dominantly under influence of the harder element and continuously decreases with increasing of the aluminum content. Microhardness of amorphous AlTa films was higher then bulk value of harder element (Ta) in combination. Simple linear relationship between the Vickers hardness and elastic energy fraction was established. Part of the elastic energy in the microhardness is also linearly correlated with the stresses in films.

Hardness ; stress ; thin films

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