Compact Capacitance Model for Drain-Induced Barrier-Lowering of Vertical SONFET (CROSBI ID 548704)
Prilog sa skupa u zborniku | izvorni znanstveni rad | međunarodna recenzija
Podaci o odgovornosti
Sviličić, Boris ; Jovanović, Vladimir ; Suligoj, Tomislav
engleski
Compact Capacitance Model for Drain-Induced Barrier-Lowering of Vertical SONFET
Drain-induced barrier-lowering (DIBL) of the vertical fully-depleted silicon-on-nothing (SON) FET is extracted from the compact capacitance model of the transistor in subtreshold region. In order to verify the accuracy of the compact model, the calculated DIBL values are compared with the results obtained by the twodimensional numerical device simulator Medici over a wide range of different geometrical and material parameters. The developed model fits the Medici results, especially in the long channel region, whereas accuracy drops for shorter channels.
Silicon-On-Nothing; vertical SONFET; drain-induced barrier-lowering
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Podaci o prilogu
85-88.
2009.
objavljeno
Podaci o matičnoj publikaciji
Proceedings of 32nd International Convention MIPRO 2009
Biljanović, Petar ; Skala, Karolj
Rijeka: Hrvatska udruga za informacijsku i komunikacijsku tehnologiju, elektroniku i mikroelektroniku - MIPRO
978-953-233-044-1
Podaci o skupu
32nd International Convention MIPRO 2009
predavanje
25.05.2009-29.05.2009
Opatija, Hrvatska