engleski

Application of the phonon confinement model on the optical phonon mode of silicon nanoparticles

The Si-rich oxide (SiOx) thin films are prepared by the physical vapor deposition method (PVD). In order to induce the phase separation to SiO2 and Si phases the samples were annealed at the temperatures 950–1100 °C. The phonon confinement model of the optical modes and the low frequency spherical acoustic vibration modes model were used to calculate the size of silicon nanoparticles from the recorded Raman spectra. In comparison to the high resolution transmission electron microscopy measurements, the both – acoustic and optical vibrational modes give not, vert, similar50% in average larger diameter of silicon nanoparticles. The results are interpreted by the formation of an amorphous silicon rich oxide layer that surrounds the silicon nanoparticle.

Silicon ; Nanoparticles ; Raman spectrocopy

A Collection of Papers Presented at the XXIX European Congress on Molecular Spectroscopy, Opatija, Croatia, August 31 - September 5, 2008.