X-ray characterization of semiconductor nanostructures (CROSBI ID 170733)
Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija
Podaci o odgovornosti
Holy, Vaclav ; Buljan, Maja ; Lechner, Rainer
engleski
X-ray characterization of semiconductor nanostructures
Theoretical description of x-ray scattering from nanostructures is briefly summarized. The application of x-ray scattering for the investigation of the structure of nanocrystals is demonstrated by two characteristic examples comprising standard small-angle x-ray scattering from nanocrystals in an amorphous matrix and x-ray diffraction from crystalline inclusions in an epitaxial layer. New synchrotron-based x-ray scattering methods are briefly discussed.
X-ray scattering ; nanocrystals ; defects and impurities:doping ; implantation ; distribution ; concentration ; etc.
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Podaci o izdanju
26 (6)
2011.
064002
7
objavljeno
0268-1242
1361-6641
10.1088/0268-1242/26/6/064002