engleski

Nickel nanoparticles formed by magnetron sputtering

Thin nickel films (2-16 nm) have been deposited onto monocrystalline (Si, sapphire) and glassy substrates (fused silica, glass) held at room temperature, 300°C, and 450°C, respectively. Further, Ni nanoparticles (NP) have been formed by codeposition of nickel and silica (or alumina), either in a single mixed layer, or as a multilayer (10 or 20 bilayers) stack which were subsequently annealed in order to improve the NP's crystallinity and 3-dim ordering. The nickel concentration within the mixed layers, dielectric spacer thickness, and substrate temperature were varied in these depositions, respectively. The prepared samples have been characterized by the appropriate methods: the average thickness of the pure Ni films and multilayer periodicity was determined by the XRR, while the film surface topography has been observed by the AFM and SEM. GISAXS measurements were performed at Sincrotrone Trieste, at 8 keV and with the 2-dim detector. Optical and magnetic properties of either surface Ni-nanoclusters or Ni-nanoparticles embedded into dielectric matrix have been probed, as well.

nickel; nanoparticles; magnetron sputtering; silica; multilayers

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