Silicon Surface Irradiated by Nitrogen Laser Radiation (CROSBI ID 476364)
Prilog sa skupa u zborniku | izvorni znanstveni rad | međunarodna recenzija
Podaci o odgovornosti
Henč-Bartolić, Višnja ; Andreić, Željko ; Gracin, Davor ; Kunze, H.-J. ; Stubičar, Mirko
engleski
Silicon Surface Irradiated by Nitrogen Laser Radiation
Monocrystalline silicon target was irradiated with a nitrogen laser beam (1.1 J/cm2 -max., 337 nm, 6 ns). The plasma formed near the silicon surface was observed spectroscopically (ne = 3x1018 cm-3, Te = 1.6 eV in air and ne = 6.5x10-17 cm-3, Te = 1.4 eV in vacuum, respectively). The irradiated surface in vacuum was studied by a metallographic microscope. At crater edges droplets were created; this is explained with the hydrodynamical sputtering model.
Silicon target; laser; plasma; surface damage
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Podaci o prilogu
357-361-x.
1996.
objavljeno
Podaci o matičnoj publikaciji
Filetin, Tomislav
Zagreb: Hrvatsko društvo za materijale i tribologiju (HDMT)
Podaci o skupu
1. International Conference: Development, Testing and Application of Materials
predavanje
02.10.1996-05.10.1996
Opatija, Hrvatska
