engleski

Model of relaxation kinetics of amorphous Al-(Mo, W) thin films under isochronal heating

Relaxation processes and crystallization kinetics of Al-(Mo, W) amorphous thin films under isochronal conditions was examined by continuous in situ electrical resistance measurements in vacuum. For the isochronal heating, it was observed that the relaxation effects decreased with an increase of the heating rate and decreased with the content of molybdenum and tungsten in the film. Assuming the linear dependence of resistivity with temperature, the linear rho(T) contribution is extracted from the relaxation effects. Adopted experimental function of rho(T) is fitted to a modified Bloch-Gruneisen formula with excellent agreement of experimental data and fitting function. For the Al-Mo amorphous alloys the BGF function contribution increases with the increase of the Al content, this is in accordance with the experimentally observed fact that the relaxation effects also increased with increasing Al content. The most stable Al-W amorphous alloys have the smallest linear contribution. In the Al-TE amorphous alloys, the structural relaxation enhances short range ordering.

relaxation kinetics; amorphous alloys; thin films; isochronal heating

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