engleski

Development and applications of silicon nanostructuring

Silicon nanomaterials, known as one of the most important types of nanomaterials, feature a number of unique merits, such as excellent electronic/mechanical/optical properties, huge surface-to-volume ratios, and facile surface modification [1]. Fast development of silicon nanomaterials with well-defined structures and required functionalities has vastly promoted the advancement of silicon nanotechnology. Structuring surface and bulk of (poly)crystalline silicon on diff erent length scales can signifi cantly alter its properties and improve the performance of opto-electronic devices and sensors based on silicon. Diff erent dominant feature scales are responsible for modifi cation of some of electronic and optical properties of silicon. We present several chemical methods for easy structuring of silicon on nano and micro-scales, based on both electroless and anodic etching of silicon in hydrofl uoric acid based etchants, and chemical anisotropic etching of silicon in basic environments. We show how successive micro and nano structuring creates hierarchical silicon surfaces, which can be used to simultaneously exploit the advantages of both structuring feature length scales. We present some fi nal results of application of silicon nano structuring in development of SERS substrates [2] and silicon/organic heterojunctions for IR light sensing [3]. [1] G.F. Grom, D.J. Lockwood, J.P. McCaff rey, H.J. Labbe, P.M. Fauchet, B. White, J. Diener, D. Kovalev, F. Koch, L. Tsybeskov, Nature 407 (2000) 358 [2] L. Mikac, M. Ivanda, V. Đerek and M. Gotić, J. Raman Spectr. (2016). Doi: 10.1002- jrs.4911 [3] V. Đerek, E. D. Głowacki, M. Sytnyk, W. Heiss, M. Marciuš, M. Ristić, M. Ivanda, and N. S. Sariciftci, Appl. Phys. Lett. 107 (2015) 083302.

silicon ; nanostructuring ; applications ; sers ; sensors

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