Temperature behaviour of the average size of nanoparticle lattices co-deposited with an amorphous matrix. Analysis of Ge + Al2O3 and Ni + Al2O3 thin films (CROSBI ID 245562)
Prilog u časopisu | izvorni znanstveni rad | međunarodna recenzija
Podaci o odgovornosti
Mezzasalma, Stefano ; Car, Tihomir ; Nekić, Nikolina ; Jerčinović, Marko ; Buljan, Maja
engleski
Temperature behaviour of the average size of nanoparticle lattices co-deposited with an amorphous matrix. Analysis of Ge + Al2O3 and Ni + Al2O3 thin films
We theoretically interpret the thermal behaviour of the average radius versus substrate temperature of regular quantum dot/nanocluster arrays formed by sputtering semiconductor/metal atoms with oxide molecules. The analysis relies on a continuum theory for amorphous films with given surface quantities, perturbed by a nanoparticle lattice. An account of the basic thermodynamic contributions is given in terms of force-flux phenomenological coefficients of each phase (Ge, Ni, Al2O3). Average radii turn out to be expressible by a characteristic length scale and a dimensionless parameter, which mainly depend upon temperature through diffusion lengths, film pressures and finite-size corrections to interfacial tensions. The numerical agreement is good in both Ge (4%) and Ni (15.4%) lattices grown at temperatures <= 800 K, despite the lower temperature behaviour of quantum dots seeming to suggest further driving forces taking part in such processes.
nanoparticle lattice ; thin amorphous oxide films ; continuum thermodynamic theories ; thermal effects ; sputtering
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Podaci o izdanju
29 (43)
2017.
435301
15
objavljeno
0953-8984
1361-648X
10.1088/1361-648X/aa7f3c