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Quantitative Analysis of a-Si1-xCx:H Thin Films by Vibrational Spectroscopy and Nuclear Methods

Thin amorphous hydrogenated silicon-carbon films, a-Si1-xCx:H were deposited by magnetron sputtering on glass and mono-crystalline substrate with carbon content from x = 0.2 to x = 1, wide variation of hydrogen concentration and different degrees of structural ordering. The obtained films were investigated by FTIR (Fourier Transform Infra-Red) spectroscopy, Raman spectroscopy, RBS (Rutherford Backscattering) and ERDA (Elastic Recoil Detection Analysis). The results of the quantitative analyses obtained by the above-mentioned techniques were compared. It has been concluded that the applied vibrational methods can be used as quantitative which enables estimation of the degree of chemical ordering in the analysed samples.

quantitative analysis; amorphous silicon carbide; FTIR; Raman; RBS; ERDA

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