Deep level defects in oxygen doped EFG poly-Si (CROSBI ID 481316)
Prilog sa skupa u zborniku | izvorni znanstveni rad | međunarodna recenzija
Podaci o odgovornosti
Pivac, B. ; Borjanović, V. ; Kovačević, I. ; Zulim, I.
engleski
Deep level defects in oxygen doped EFG poly-Si
There is a considerable current interest in polycrystalline silicon and edge-defined film-fed growth (EFG) technique is suitable candidate for the low-cost solar cell production. Recently, it has been shown that oxygen addition during the crystal growth yields a higher efficiency solar cells. We studied deep levels associated with structural defects like dislocations and grain boundaries, and influence of oxygen addition to the bulk on the picture of deep levels in the material. We have shown that levels attributed to dislocations are directily influenced by oxygen addition. We have also found that such levels originate predominantly from grain boundaries and to lesser extent from intragrain regions.
oxygen doped EFG poly-Si
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Podaci o prilogu
276-279.
2000.
objavljeno
Podaci o matičnoj publikaciji
Anchorage (AK): Institute of Electrical and Electronics Engineers (IEEE)
Podaci o skupu
poster
15.09.2000-22.09.2000
Anchorage (AK), Sjedinjene Američke Države