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Pregled bibliografske jedinice broj: 877020

Časopis

Autori: Šarić, Iva; Peter, Robert; Kavre Piltaver, Ivna; Jelovica Badovinac, Ivana; Salamon, Krešimir; Petravić, Mladen
Naslov: Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
Izvornik: Thin solid films (0040-6090) 628 (2017); 142-147
Vrsta rada: članak
Ključne riječi: Titanium dioxide ; Atomic layer deposition ; Residual chlorine ; Thin films ; Crystallization
Sažetak:
We have studied the presence of residual chlorine in thin TiO2 films grown by plasma enhanced atomic layer deposition (PEALD) at temperatures within 40–250 °C range, using x-ray photoemission spectroscopy, secondary ion mass spectrometry, grazing incidence x-ray diffraction and scanning electron microscopy. The source of the residual chlorine is TiCl4, which was used as a titanium precursor in ALD. The PEALD results are compared with the results on ALD films grown thermally in the same reactor. Films deposited by PEALD show a lower amount of residual chlorine, while chlorine concentration decreases with the processing temperature in both ALD techniques. In addition to the standard signal from residual chlorine bonded to Ti, a strong signal from Cl-O bonds was observed in PEALD samples grown at low temperatures. Our study also shows the development of an anatase phase in TiO2 films grown above 200 °C, which correlates well with the reduction of both types of residual chlorine in PEALD samples.
Izvorni jezik: ENG
Rad je indeksiran u
bazama podataka:
Current Contents Connect (CCC)
Scopus
SCI-EXP, SSCI i/ili A&HCI
Science Citation Index Expanded (SCI-EXP) (sastavni dio Web of Science Core Collectiona)
Kategorija: Znanstveni
Znanstvena područja:
Fizika
URL Internet adrese: http://www.sciencedirect.com/science/article/pii/S0040609017302006
https://doi.org/10.1016/j.tsf.2017.03.025
Broj citata:
Altmetric:
DOI: 10.1016/j.tsf.2017.03.025
URL cjelovitog teksta:
Google Scholar: Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
Upisao u CROSBI: Ivna Kavre Piltaver (ivna.kavre@uniri.hr), 24. Svi. 2017. u 11:57 sati



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